In-situ annealing of NiTi thin films at different temperatures

Magnetron sputtered NiTi thin films are usually sputtered at ambient temperature and need a post-annealing treatment to promote crystallization and obtain shape memory effect. However, this treatment could adversely affect the microstructure as well as the morphology of the film. Within this study, NiTi thin films were generated by annealing during the sputtering process. The effect of the sputtering temperature on the morphology of the film, the composition, and shape memory behavior was studied using X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), field emission scanning electron microscopy (FESEM), and differential scanning calorimetry (DSC).