کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7176204 | 1466705 | 2018 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Low-temperature diffusion bonding of W/Mo joints with a thin Cu interlayer
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی صنعتی و تولید
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
By adding a thin Cu interlayer, refractory metals 93W and Mo1 can be reliably bonded by plasma activated sintering at low temperature. High resolution observations and an analysis of the joints indicate that the elements are sufficiently diffused at the interface of the W/Mo joints with a thin Cu interlayer without the formation of any intermetallic compounds. The maximum average shear strength of the W/Mo joint bonded at 700â¯Â°C for 20â¯min is greater than 210â¯MPa. Fe and Ni atoms in the 93â¯W alloy can diffuse into the thin Cu layer and form a Cu solid solution. The presence of Fe and Ni in the Cu solid solution promotes diffusion bonding at both the W/ thin Cu and thin Cu /Mo interfaces, which contributes to the high bonding strength of the W/Mo joint bonded at low bonding temperatures. The fracture model of the W/Mo joint bonded at 700â¯Â°C is a mixture of brittle fracture in the W base metal, ductile fracture in the thin Cu layer and brittle fracture in the Mo base material.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Materials Processing Technology - Volume 262, December 2018, Pages 422-429
Journal: Journal of Materials Processing Technology - Volume 262, December 2018, Pages 422-429
نویسندگان
Mei Rao, Jian Zhang, Jiahui Ding, Guoqiang Luo, Qiang Shen, Lianmeng Zhang,