Fabrication of metallic nanomesh structures using phase shift lithography and its application to touch screen panels

This study reports on the fabrication process of a nanomesh-shaped nickel mold by using phase shift lithography. We also present its application to a transparent electrode film for a touch screen panel. A suitable gap between the checkerboard- shaped patterns on a photomask was chosen to obtain the nickel mold with a mesh-shaped pattern connected to each other. A nanomesh-type trench pattern was transferred from the nickel mold onto a polyethylene terephthalate film through the imprinting lithography process with ultraviolet light. The nanomesh- embedded electrode pattern was fabricated by filling the nanotrench with Ag paste. The light transmittance and sheet and line resistance of the nanomesh-type transparent conducting electrode film were evaluated. The TCE film was then applied to a 7 in. touch sensor module.