Effect of thermal annealing on stress relaxation and crystallisation of ion beam sputtered amorphous Si1-xGex thin films

Effect of thermal annealing on stress relaxation and crystallisation of ion beam sputtered amorphous Si1-xGex thin films

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials & Design - Volume 156, 15 October 2018, Pages 389-397

F. Guo, M. Martyniuk, D. Silva, Y. Liu, K. Brookshire, L. Faraone,