Fabrication of high aspect ratio subwavelength gratings based on X-ray lithography and electron beam lithography

In this paper, we present two nano-fabrication technologies that provide effective approaches for low-cost, large-scale manufacturing of nano-gratings. One grating is fabricated on polymethylmethacrylate (PMMA) with the pitch of 500 nm, and height of 2000 nm, and the other is fabricated on silicon wafer with the pitch of 666 nm, and height of 200 nm. High aspect ratio PMMA nanostructures which use X-ray lithography and electron beam lithography (EBL) are reported in this paper. These gratings can be used as molds, making it possible for industrial nano-imprinting technology to significantly cut cost and shorten process time.

► Two kinds of high aspect ratio subwavelength gratings are manufactured.
► These gratings can be used as mold for nano-imprinting technology.
► Fast atom beam (FAB) etching is used for effective fabrication.
► A coupling layer is introduced to keep the gratings from conglutination