Recent developments in nanofabrication using scanning near-field optical microscope lithography

In addition to its well-known capabilities in imaging and spectroscopy, scanning near-field optical microscopy (SNOM) has recently shown its great potentials for fabricating various structures at the nanoscale. A variety of SNOM-based fabrication techniques have been developed for different applications. In this paper, the SNOM-based techniques involving three major functions: material modification, addition, and removal, are examined with emphasis on their abilities and reliability to make structures with resolutions at the nanometer level. The principles and procedures underlying each technique are presented, and the differences and uniqueness among them are subsequently discussed. Finally, concluding remarks are provided to summarize the major techniques studied and to recommend the scopes for technology improvement and future research.