کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
735249 893588 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Micro-Raman spectroscopy characterization of polycrystalline silicon films fabricated by excimer laser crystallization
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Micro-Raman spectroscopy characterization of polycrystalline silicon films fabricated by excimer laser crystallization
چکیده انگلیسی

The rapid recrystallization of amorphous silicon films utilizing excimer laser crystallization (ELC) is presented. The resulting poly-Si films are characterized by Raman spectroscopy. Polycrystalline silicon (poly-Si) films with higher crystallinity can be realized by a dehydrogenation process before ELC. Raman spectra as a function of various excimer laser energy densities are demonstrated. The crystallinity and residual stress of the poly-Si films are determined and discussed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics and Lasers in Engineering - Volume 47, Issue 5, May 2009, Pages 612–616
نویسندگان
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