Resolution enhancement using pulse width modulation in digital micromirror device-based point-array scanning pattern exposure

• The objective of this study is to improve the linewidth resolution using the PWM technique.
• Field tracing technique is used for the design of point-array projection lithography.
• The dynamics of point-array exposure is modeled under PWM exposure mode.
• Improved photoresist line widths under PWM exposure are demonstrated.

Digital-mask lithography systems, with a digital micromirror device (DMD) as their central piece, have been widely used for defining patterns on printed circuit board (PCB). This study designed optical module parameters for point-array projection lithography based on field tracing technique to improve the quality of the aerial image on the exposure plane. In the realized optical module for the point-array projection lithography, a DMD was used as the dynamic digital-mask, and a 405-nm-wavelength laser was used to illuminate the DMD. The laser was then focused through the micro-lens array in the optical module to form a point array and was projected onto a dynamic scanning stage. By calculating the beam-overlapping rate, stage velocity, spot diameter, and DMD frame rate and programming them into the stage- and DMD-synchronized controller, the point array formed line patterns on the photoresist. Furthermore, using pulse width modulation (PWM) technique to operate the activation periods of the DMD mirrors effectively controlled the exposure and achieved a feature linewidth of less than 10 μm.