کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
738230 | 1461934 | 2007 | 6 صفحه PDF | دانلود رایگان |
This paper describes a simple and effective method to fabricate various shapes and profiles of three-dimensional (3-D) silicon microstructures using a shape-controllable 3-D lithography along with dry plasma etching. The first step is to fabricate 3-D photoresist patterns with various slopes and round profiles on a silicon substrate by the shape-controllable 3-D lithography using polymer dispersed liquid crystal (PDLC) films, which is compatible to conventional lithography process. The second step is to transfer the sloping photoresist patterns into the silicon by etching 3-D photoresist molds and the silicon surface through inductively coupled plasma (ICP) process successively. The proposed microfabrication method for 3-D silicon microstructures can be widely applied for silicon lens arrays and silicon solar cells.
Journal: Sensors and Actuators A: Physical - Volume 139, Issues 1–2, 12 September 2007, Pages 281–286