Development of a novel micromirror based on surface micromaching technology

A novel 3 × 3 micromirror array is designed and successfully fabricated with multi-layer silicon surface micromaching technology. It is composed of bottom electrode, support part and mirror plate, in which a T type beam structure is used to support the mirror plate. It can provide mirror with the vertical movement and the rotation about two horizontal axes, thus enabling phase modulation and amplitude modulation for the incident light. The test results show that the maximum deflection length along the vertical direction of the mirror plate is 2 μm, while the rotation angle about X- and Y-axis are ±2.3° and ±1.45°, respectively.