کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
738648 | 894021 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Indirect removal of SU-8 photoresist using PDMS technique
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Indirect removal of SU-8 photoresist using PDMS technique Indirect removal of SU-8 photoresist using PDMS technique](/preview/png/738648.png)
چکیده انگلیسی
SU-8 photoresist shows superior images for thick film lithography and has been utilized as an electroplating mold. However, crosslinked SU-8 is difficult to remove reliably from high-aspect-ratio microstructures (HARMs) without damage or alteration to the electroplated metal. In this paper, an indirect SU-8 removal method is proposed. Instead of directly using SU-8 microstructure as the electroplating mold, a polydimethysiloxane (PDMS) replica is employed. The metallic micromold insert obtained through this method can be easily peeled off from the PDMS replica, meanwhile with high resolution and smooth surfaces.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Sensors and Actuators A: Physical - Volume 125, Issue 2, 10 January 2006, Pages 586–589
Journal: Sensors and Actuators A: Physical - Volume 125, Issue 2, 10 January 2006, Pages 586–589
نویسندگان
Jianhua Li, Di Chen, Jinya Zhang, Jingquan Liu, Jun Zhu,