کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
767884 | 897233 | 2009 | 11 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Near tip stress intensity factor for an edge-crack in a Pb(ZrxTi1−x)O3 thin film with 90° domain switching under a continuous laser irradiation Near tip stress intensity factor for an edge-crack in a Pb(ZrxTi1−x)O3 thin film with 90° domain switching under a continuous laser irradiation](/preview/png/767884.png)
The near tip stress intensity factor KItip for an edge-crack in a Pb(ZrxTi1−x)O3 thin film was investigated by superposition of the applied stress intensity factor KIapp under a continuous laser irradiation and the shielding stress intensity factor ΔKI for 90° domain switching. Both KIapp and ΔKI were solved by the weight function method, and switching toughening was analyzed based on the small scale domain switching theory. Results show that KItip of the edge-crack in the thin film is significantly affected by the initial poling angle, and the edge-crack tip is toughened by the domain switching area with the increase of the initial poling angle. The methodology can predict the fracture toughening of Pb(ZrxTi1−x)O3 thin films quantitatively.
Journal: Engineering Fracture Mechanics - Volume 76, Issue 12, August 2009, Pages 1811–1821