کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
777352 1463524 2009 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of surface treatments on interfacial adhesion energy between UV-curable resist and glass wafer
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی مکانیک
پیش نمایش صفحه اول مقاله
Effect of surface treatments on interfacial adhesion energy between UV-curable resist and glass wafer
چکیده انگلیسی

The interfacial adhesion energy between the resist and the substrate is very important in nanoimprinting because of problems with the resist sticking or pulling off during separation of the mold from the substrate. Substrate surface treatments with a self-assembled monolayer or oxygen plasma provide good adhesion between a resist coating and a silica substrate. In this paper, we describe the adhesion properties of a resist and a glass wafer measured using the four-point bending test. The interfacial adhesion energy between the resist and the glass wafer was evaluated for various substrate surface treatments of adhesion promoters and anti-sticking layers. The interfacial fracture energy without treatment was 1.23 J/m2, and was in the range 0.49–2.57 J/m2 for the other treatments tested. The interfacial fracture surfaces were also investigated by field emission scanning electron microscopy, energy dispersive spectroscopy, and X-ray photoelectron spectroscopy to determine the fracture mode at the interfaces.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Adhesion and Adhesives - Volume 29, Issue 6, September 2009, Pages 662–669
نویسندگان
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