کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7845994 | 1508603 | 2018 | 24 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evaluation of thermal stability in spectrally selective few-layer metallo-dielectric structures for solar thermophotovoltaics
ترجمه فارسی عنوان
ارزیابی استحکام حرارتی در ساختارهای فلزی الکترولیتی چند لایه انتخابی طیفی برای ترموفوتوولتاسیون خورشیدی
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
طیف سنجی
چکیده انگلیسی
The thermal stability of spectrally selective few-layer metallo-dielectric structures is evaluated to analyze their potential as absorber and emitter materials in solar thermophotovoltaic (STPV) systems. High-efficiency (e.g., STPV) systems require materials with spectrally selective properties, especially at high temperatures (>1273â¯K). Aiming to develop such materials for high-temperature applications, we propose a few-layer structure composed of a refractory metal (i.e., Mo) nanometric film sandwiched between the layers of a dielectric material (i.e., hafnium oxide, HfO2) deposited on a Mo bulk substrate. In vacuum conditions (<5â¯Ãâ¯10-2â¯Pa), the few-layer structure shows thermal stability at 1423â¯K for at least 1â¯h. At 1473â¯K, the spectral selectivity was degraded. This could have been caused by the oxidation of the Mo thin film by the residual oxygen through the grain boundaries of the upper HfO2 layer. This experiment showed the potential stability of few-layer structures for applications working at temperatures greater than 1273â¯K as well as the degradation mechanism of the few-layer structure. This characteristic is expected to help improve the thermal stability in few-layer structures further.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Quantitative Spectroscopy and Radiative Transfer - Volume 212, June 2018, Pages 45-49
Journal: Journal of Quantitative Spectroscopy and Radiative Transfer - Volume 212, June 2018, Pages 45-49
نویسندگان
Makoto Shimizu, Asaka Kohiyama, Hiroo Yugami,