Filter algorithm for influence functions in the computer controlled polishing of high-quality optical lenses

Computer controlled polishing (CCP) is widely used in the production of high-quality optical lenses. CCP enables surface error-profile-dependent calculation of polishing sequences prior to processing, and facilitates the cost-effective manufacture of high-quality optical surfaces. Calculation of an individual polishing sequence requires knowledge of the surface error-profile in addition to knowledge of the material removal characteristic (influence function) of the polishing tool. Measurement errors during both determination of the surface error-profile, and the influence function, may lead to an incorrect polishing sequence calculation, which in turn may result in an inadequate product quality. A new method has been developed which minimises the effects of measurement errors on the influence function. The resulting algorithm renders an influence function symmetrical and filters noisy data. Practical polishing tests with magnetorheological finishing have been performed to verify this new technique. The improvement of the peak-valley (PV) value of the surfaces polished with the symmetrical rendered influence function was observed to average 14% greater than that which related to the PV value improvement of those surfaces which were polished with the unmodified influence function. The algorithm developed is based on software and is easily implemented. Thus, artificial enhancement of an influence function is a straightforward technique to improve the result of the polishing process.