A new validation method for modeling nanogap fabrication by electromigration, based on the Resistance-Voltage (R-V) curve analysis

► We fabricate nanogaps in gold wires by Electromigration Induced Break Junction. ► We validate a model of electromigration by analysing the fabrication R-V curves. ► The model simulates nanogap formation and predicts main electro-thermal parameters. ► We explain the advantages of this validation method respect to previous methods. ► We debate how model predictions can improve the control of the fabrication process.