The effect of deposition parameters and Ti content on structural and wear properties of MoS2Ti coatings

MoS2Ti composite films were deposited on silicon wafers and AISI 440C steel substrates with different target currents and working pressures by closed field unbalanced magnetron sputtering (CFUBMS). The composition of MoS2Ti films was determined by EDS. Crystallographic properties of MoS2Ti composite films produced were investigated by XRD and the friction and wear properties were determined by means of pin-on-disk tribotester. The effect of deposition parameters and Ti content on crystallographic orientation and friction coefficient and wear rate was examined.