کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9703550 | 1463553 | 2005 | 11 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
An investigation of plasma processes in titanium(iv) isobutoxide: the formation of films on Ti and Si
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی مکانیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: An investigation of plasma processes in titanium(iv) isobutoxide: the formation of films on Ti and Si An investigation of plasma processes in titanium(iv) isobutoxide: the formation of films on Ti and Si](/preview/png/9703550.png)
چکیده انگلیسی
The single lap shear (SLS) strengths for plasma-reacted TiiB-titanium alloy specimens bonded with a polyimide adhesive were compared with titanium substrates that had been cleaned with acetone and bonded with the same adhesive. The best SLS strength of 30.3±3.5 MPa (4390±510 psi) was obtained from samples coated with a PP TiiB film deposited at 10 W with argon as the carrier gas. Further, the failure mode for all samples pretreated with PP TiiB was interfacial at the PP film/substrate interface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Adhesion and Adhesives - Volume 25, Issue 4, August 2005, Pages 277-287
Journal: International Journal of Adhesion and Adhesives - Volume 25, Issue 4, August 2005, Pages 277-287
نویسندگان
R.A. DiFelice, J.G. Dillard, D. Yang,