کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9834649 | 1524912 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Studies of ferromagnetic resonance line width during electrochemical deposition of Co films on Au(1Â 1Â 1)
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
In situ ferromagnetic resonance (FMR) measurements were performed during and after the electrochemical deposition of Co on Au(1Â 1Â 1)/mica substrates using classical three-electrode cell under potential control. The influence of an electrolytically deposited Cu cover layer was investigated by in situ FMR measurements. Prior to the Cu deposition a FMR line width as small as 15Â mT was observed. With the Cu covering the crystalline distribution of the Co film is increased and the surface anisotropy is decreased, leading to an enlargement of the FMR line width by a factor of 2 and a change of the FMR line position and shape.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Magnetism and Magnetic Materials - Volume 286, February 2005, Pages 286-290
Journal: Journal of Magnetism and Magnetic Materials - Volume 286, February 2005, Pages 286-290
نویسندگان
D. Spoddig, R. Meckenstock, J.P. Bucher, J. Pelzl,