Optical bistability of nonlinear multilayered structure containing left-handed materials

We investigate the optical bistability in a multilayered structure containing alternating left-handed materials (LHM) and conventional (right-handed) materials. Numerical calculations show that optical bistability can appear in both Bragg and zero-〈n〉 gaps inside the structure created by alternating right-handed materials (RHM) and LHM with an embedded nonlinear LHM (or nonlinear RHM) defect layer. We find that even if the properties of nonlinear defect layer change from double-negative to single-negative materials with increasing the incident field intensity, the bistability can still be obtained. Moreover, we also analyzed optical bistability in nonlinear periodic structure created by alternating RHM and nonlinear LHM. The bistability threshold values in three microstructures are also studied and compared.