Structural, electrical, and optical properties of transparent conductive ZnO:Ga films prepared by DC reactive magnetron sputtering
Keywords: 73.61−r; 78.20−e; 68.55.Jk; 81.15.cdA1. Crystal structure; A3. Magnetron sputtering; A3. ZnO:Ga films; B1. Transparent conductive oxide; B2. Electrical and optical properties; B2. Semiconducting II–VI materials