
XPS study of the deposited Ti layer in a magnetron-type sputter ion pump
Keywords: 81.65; 52.80.Sm; 52.80.Vp; 79.60; 82.80E; XPS; Thin films; Titanium nitride; Titanium oxide; Titanium carbide; Sputter ion pump; Discharge cell; Magnetron cell; Sputtering; Deposition;