Surface science studies including low-temperature RDS on MOCVD-prepared, As-terminated Si(1 0 0) surfaces
Keywords: 61.14.Hg; 68.37.Ef; 68.43.Fg; 81.15.Gh; 81.05.CyA1. Adsorption; A1. Reflectance difference spectroscopy; A1. Scanning tunnelling microscopy; A3. Metalorganic chemical vapour deposition; B2. Semiconducting III–V materials; B2. Semiconducting silicon