
Analysis of mechanism of carbon removal from GaAs(1 0 0) surface by atomic hydrogen
Keywords: تمیز کردن; 81.05.Ea, 79.60.Dp, 81.65.Cf, 79.20.Rf, 81.70.Jb; GaAs; Cleaning; Etching; Atomic hydrogen; Auger electron spectroscopy; Mass spectrometry; X-ray photoelectron spectroscopy; Reaction products; Carbon species; Auger carbon pattern;