Poole-Frenkel emission and defect density in a-Si:H/nc-Si:H multilayer films for “all silicon” third generation photovoltaics
Keywords: رسوب بخار شیمیایی داغ سیم; Amorphous hydrogenated silicon; Nanocrystalline hydrogenated silicon; Multilayers; Hot-wire chemical vapour deposition; Hydrogen dilution; Poole-Frenkel emission;