Strain stabilization of SiGe films on Si(0Â 0Â 1) by in situ pre-epitaxial HCL etching
Keywords: اچ در محل; 61.10.Nz; 61.72.Dd; 81.15.Gh; 61.72.Ff; In situ etching; Relaxation; Diffuse scattering; SiGe;