
Changes in Gd2O3 films grown on Si(100) as a function of nitridation temperature and Zr incorporation
Keywords: 77.55.+f; 71.20.Eh; 68.55.JkGadolinium oxide; Annealing; Ammonia; Nitridation; Silicides; Zr-silicate; Interfacial reactions; X-ray diffraction; X-ray photoelectron spectroscopy; Near edge X-ray absorption spectroscopy