
RF-CF4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR
Keywords: پلاسما; 81.15.Fg; 52.38.Ph; 52.77.Bn; 52.40 Hx; 82.33.Xj; Plasma; Film deposition; Etching; Plasma surface interaction; Paper; Two sidedness;