کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10128793 | 1645147 | 2018 | 19 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Nano-structural investigation of Ti-Al-N/Mo-Si-B multilayer coatings: A comparative study by APT and HR-TEM
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
Nano-composites often represent a challenge for spatially resolved analysing methods. The overlap of specific signals, for example in the mass-to-charge spectrum during atom probe tomography (APT) analysis or the intersection of electron energy loss edges in electron energy loss spectroscopy (EELS), leads to highly challenging results. Therefore, a complementary use of different techniques is essential to fully characterise a given system. Within this work, we studied our Ti-Al-N/Mo-Si-B multilayer (comprising alternating 31â¯nm thin arc evaporated fcc-Ti0.57Al0.43N layers and amorphous 6â¯nm thin Mo0.58Si0.28B0.14 layers), by high-resolution transmission electron microscopy, EELS as well as APT and completed the results by comprehensive X-ray diffraction measurements. We focused on the microstructure and crystallographic evolution during thermal loading - up to 1400â¯Â°C - and hence a detailed analytical description applying a wide set of high resolution techniques. When exposed to high temperatures, the as-deposited amorphous MoSiB layers form the oxidation resistant, intermetallic phases T1-Mo5Si3 and T2-Mo5SiB2. The layered arrangement between Ti-Al-N and Mo-Si-B allows to postpone the formation of the comparative soft, hexagonal wurtzite type AlN (due to the decomposition of fcc-Ti1-xAlxN layers) up to 1200â¯Â°C, which is by â¼200-300â¯Â°C above the typical formation temperature of w-AlN in homogeneously grown single phase fcc-Ti1-xAlxN thin films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 157, November 2018, Pages 173-179
Journal: Vacuum - Volume 157, November 2018, Pages 173-179
نویسندگان
E. Aschauer, S. Sackl, T. Schachinger, T. Wojcik, H. Bolvardi, M. Arndt, P. Polcik, H. Riedl, P.H. Mayrhofer,