کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10128797 | 1645147 | 2018 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
The film hardness of 30â¯GPa and more and the elastic modulus of 200-240â¯GPa do not strongly depend on RTC at RTC less than 25%, beyond which they decrease to 15.8â¯GPa and 122â¯GPa. However, the value of the compressive stress and the friction coefficient gradually decrease with the increase in RTC. X-ray diffraction peak of (111) texture is observed for the films prepared at RTC less than 25%, showing the grain size of about 8-15â¯nm. On the other hand, the hardness and the value of the stress increase with the increase in the dissipated energy per pulse (Ep) at RTC less than 25%. Chemical compositions and bonding states of films are investigated by X-ray photoelectron spectroscopy (XPS) and transmission electron microscope (TEM) - electron energy loss spectroscopy (EELS). Based on XPS measurements, the relative content of C increases from 2.8 to 65% with the increase in RTC. On the other hand, the relative content of N is close to that of Ti and it decreases from 46 to 17%. The intensity of the peak related to Ti-N bond is largest among all intensities of the peaks related to the binary or ternary compounds including Ti component, whereas the intensity related to sp2 C-C bond increases with RTC. These intensity ratios depend on RTC, but they are not sensitive to Ep.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 157, November 2018, Pages 192-201
Journal: Vacuum - Volume 157, November 2018, Pages 192-201
نویسندگان
Takashi Kimura, Ryo Yoshida, Kingo Azuma, Setsuo Nakao,