کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10134208 | 1645608 | 2018 | 25 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of substrate temperature on growth and Electrochromic properties of WO3 thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی (عمومی)
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چکیده انگلیسی
WO3 thin films are prepared by electron beam evaporation (EBE) technique under the base pressure of 2âÃâ10-5 mbar at various substrate temperature (Ts) ranging from room temperature (RT) to 450â°C. The deposited films were characterized systematically to analyse the influence of substrate temperature on structural, morphological, compositional, vibrational, electrical, optical and electrochromic properties. The EDS data of deposited films confirm the presence of tungsten (W) and Oxygen (O) elements. XRD spectra reveal that films deposited at Ts < 250â°C are found to be amorphous and turns to crystalline as the substrate temperature raised to 450â°C. The morphological studies reveal that, beyond 250â°C of substrate temperature the material structure slowly changes to well crystallined structure with grain size about 70-80ânm. Wâ=âO and O-W-O bonds were present in the films which were confirmed by Raman spectra. The optical data represents the indirect allowed transitions and the band gap values are observed to be decreased from 3.24 to 2.93âeV with rise of substrate temperature from RT to 450â°C. It is also found that the RT electrical conductivity is increased with increase of Ts. Finally it is found that the coloration efficiency (CE) of the films deposited at RT is 30.63âcm2/C at the wavelength of 550ânm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - Volume 174, December 2018, Pages 470-480
Journal: Optik - Volume 174, December 2018, Pages 470-480
نویسندگان
K.V. Madhuri, M. Bujji Babu,