کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10152296 | 1666151 | 2018 | 33 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2 on Al surfaces for micromirror applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
We report on the implementation of thin atomic layer deposited coatings for environmental protection and reflectivity enhancement of Al-based micromirror devices. The reflectance characteristics of HfO2 and SiO2 thin layers on Al surfaces has been simulated by Rigorous Coupled-Wave Analysis (RCWA). Reflectance enhancement, especially in the 420-675ânm wavelength region, has been predicted by fine-tuning the layer thickness in HfO2/SiO2 dual layer stacks. This engineered solution has been developed and then implemented on real micro-electro-mechanical system (MEMS) devices demonstrating an enhancement of the reflectivity. Our approach suggests that atomic layer deposition is a valid method for both protecting and enhancing the performances of reflective surfaces of micro-opto-electro mechanical systems.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Sensors and Actuators A: Physical - Volume 282, 15 October 2018, Pages 124-131
Journal: Sensors and Actuators A: Physical - Volume 282, 15 October 2018, Pages 124-131
نویسندگان
E. Cianci, A. Lamperti, G. Tallarida, M. Zanuccoli, C. Fiegna, L. Lamagna, S. Losa, S. Rossini, F. Vercesi, D. Gatti, C. Wiemer,