کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10152296 1666151 2018 33 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2 on Al surfaces for micromirror applications
موضوعات مرتبط
مهندسی و علوم پایه شیمی الکتروشیمی
پیش نمایش صفحه اول مقاله
Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2 on Al surfaces for micromirror applications
چکیده انگلیسی
We report on the implementation of thin atomic layer deposited coatings for environmental protection and reflectivity enhancement of Al-based micromirror devices. The reflectance characteristics of HfO2 and SiO2 thin layers on Al surfaces has been simulated by Rigorous Coupled-Wave Analysis (RCWA). Reflectance enhancement, especially in the 420-675 nm wavelength region, has been predicted by fine-tuning the layer thickness in HfO2/SiO2 dual layer stacks. This engineered solution has been developed and then implemented on real micro-electro-mechanical system (MEMS) devices demonstrating an enhancement of the reflectivity. Our approach suggests that atomic layer deposition is a valid method for both protecting and enhancing the performances of reflective surfaces of micro-opto-electro mechanical systems.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Sensors and Actuators A: Physical - Volume 282, 15 October 2018, Pages 124-131
نویسندگان
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