کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10365338 872037 2005 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Transient analysis of the impact stage of wirebonding on Cu/low-K wafers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Transient analysis of the impact stage of wirebonding on Cu/low-K wafers
چکیده انگلیسی
In this paper, transient mechanical responses of the Cu/low-K structure during the impact stage of the wirebonding process were investigated. Parametric studies were carried out to examine the effect of elastic moduli of different constituent materials on the potential of structural defect on the copper via and the pad. The analysis applied the explicit time integration scheme, which is feasible in dealing with the nonlinear transient structural behavior.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 45, Issue 2, February 2005, Pages 371-378
نویسندگان
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