کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10365668 | 872161 | 2014 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Activation energy of drain-current degradation in GaN HEMTs under high-power DC stress
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
We have investigated the role of temperature in the degradation of GaN High-Electron-Mobility-Transistors (HEMTs) under high-power DC stress. We have identified two degradation mechanisms that take place in a sequential manner: the gate leakage current increases first, followed by a decrease in the drain current. Building on this observation, we demonstrate a new scheme to extract the activation energy (Ea) of device degradation from step-temperature measurements on a single device. The Ea's we obtain closely agree with those extracted from conventional accelerated life test experiments on a similar device technology.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 54, Issue 12, December 2014, Pages 2668-2674
Journal: Microelectronics Reliability - Volume 54, Issue 12, December 2014, Pages 2668-2674
نویسندگان
Yufei Wu, Chia-Yu Chen, Jesús A. del Alamo,