کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10400480 | 890931 | 2005 | 15 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
LPV control for a wafer stage: beyond the theoretical solution
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی هوافضا
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چکیده انگلیسی
Although conventional PID-like SISO controllers are still most common in industry, there is a growing need for more advanced controller structures in order to comply with ever tighter performance requirements. In this paper we consider positioning devices in IC-manufacturing for which position-dependent plant dynamics are a performance limiting factor. We suggested to employ recently developed linear parameter varying (LPV) control techniques for designing position-dependent controllers that adapt themselves in order to achieve optimal closed-loop performance. Our main emphasis is on presenting a practical LPV design procedure which covers plant modeling, controller synthesis and actual implementation for an electromechanical positioning device, an advanced wafer-scanner. Our experimental results reveal that performance can be improved by LPV control if compared to a classical SISO design. We highlight a variety of troublesome aspects within the design cycle that lack a systematic theoretically founded solution and that limit the possible performance improvement achievable by LPV control.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Control Engineering Practice - Volume 13, Issue 2, February 2005, Pages 231-245
Journal: Control Engineering Practice - Volume 13, Issue 2, February 2005, Pages 231-245
نویسندگان
Matthijs Groot Wassink, Marc van de Wal, Carsten Scherer, Okko Bosgra,