کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10633650 | 993050 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Recent progress in integrated waveguides based on oxidized porous silicon
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
In this work we report the latest improvements in integrated optical waveguides based on oxidized porous silicon. Remarkably low propagation loss of 0.2 dB/cm in the visible is demonstrated. Straight waveguides of 1-10 cm long were fabricated in N+-type silicon substrates. Thickness of core region of all fabricated waveguides was of 8 μm while thickness of cladding layer was of 0.8, 1.5, and 2.5 μm. Optical loss in the visible and IR were measured by original method utilizing the 90° vertical bending at the waveguides endings which is a unique property of our waveguides. Significant improvement of the waveguide characteristics was obtained by optimizing the technological process: (a) eliminating the negative effect of swirl defects on uniformity of porous silicon layers; (b) developing the anodization regimes allowing the careful control of the porosity through the porous silicon thickness; (c) using silica mask instead of silicon nitride mask.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optical Materials - Volume 27, Issue 5, February 2005, Pages 776-780
Journal: Optical Materials - Volume 27, Issue 5, February 2005, Pages 776-780
نویسندگان
M. Balucani, V. Bondarenko, A. Klusko, A. Ferrari,