کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10640014 995865 2005 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films
چکیده انگلیسی
Chromium thin films are technologically important as underlayers for the deposition of cobalt-based magnetic films because of their good lattice match and adhesion. The structural orientation and morphology of the chromium under layers control the magnetic properties of the cobalt-based films deposited on them. Hence, optimization of the structure and properties of chromium under layers is essential for realizing magnetic thin films with desired properties. In this paper, we report the structural variation observed in chromium thin films deposited on silicon(1 0 0) substrates deposited using Ion Beam Sputter Deposition (IBSD) technique. The influence of process parameters, such as ion beam current density, substrate temperature and the angle of incidence of the condensing species, on the structural transformation from (1 1 0) orientation to (2 0 0) orientation has been presented. The structural variation and morphological variations observed have been discussed based on the growth models and the energetics involved in the process.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 123, Issue 1, 15 November 2005, Pages 7-12
نویسندگان
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