Study of the outgassing behavior of SnO2:F films on glass in vacuum under external energy excitation

Surface analysis was performed on the glass surface. As a result of XPS analysis on the glass surface, the amount of carbon compound observed was a function of baking temperature. SIMS showed that the amount of adsorbed carbon in the SnO2:F film was reduced with the increasing baking temperature, and with UV irradiation. For samples baked at 400 °C in vacuum, the carbon adsorption in SnO2:F film does not show significant difference between before and after UV irradiation.