کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10644522 | 999625 | 2008 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Multi-scale hybrid numerical simulation of the growth of high-aspect-ratio nanostructures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مکانیک محاسباتی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Multi-scale hybrid numerical simulation of the growth of high-aspect-ratio nanostructures Multi-scale hybrid numerical simulation of the growth of high-aspect-ratio nanostructures](/preview/png/10644522.png)
چکیده انگلیسی
Recently, a variety high-aspect-ratio nanostructures have been grown and profiled for various applications ranging from field emission transistors to gene/drug delivery devices. However, fabricating and processing arrays of these structures and determining how changing certain physical parameters affects the final outcome is quite challenging. We have developed several modules that can be used to simulate the processes of various physical vapour deposition systems from precursor interaction in the gas phase to gas-surface interactions and surface processes. In this paper, multi-scale hybrid numerical simulations are used to study how low-temperature non-equilibrium plasmas can be employed in the processing of high-aspect-ratio structures such that the resulting nanostructures have properties suitable for their eventual device application. We show that whilst using plasma techniques is beneficial in many nanofabrication processes, it is especially useful in making dense arrays of high-aspect-ratio nanostructures.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Computational Materials Science - Volume 44, Issue 1, November 2008, Pages 9-15
Journal: Computational Materials Science - Volume 44, Issue 1, November 2008, Pages 9-15
نویسندگان
E. Tam, K. Ostrikov, I. Levchenko, M. Keidar, S. Xu,