Submicrometer thickness layer fabrication for layer-by-layer microstereolithography using evanescent light

We propose a novel one-shot layer-by-layer microstereolithography method using evanescent light to achieve submicrometer spatial process resolution. Theoretical and experimental analyses focusing on the vertical process resolution confirm that a layer of submicrometer thickness can be photopolymerized with good thickness controllability (standard deviation of 10 nm) and that the proposed method of using evanescent light is compatible with layer-by-layer stereolithography.