Surface forming on glass material by femtosecond laser modification with HF etching process

A rapid surface-microstructuring by femtosecond laser modification without profile scanning is demonstrated on glass. The embedded grating and grid patterns are scribed inside the glass by the laser. After that, the glass is immersed in 10 wt% HF for developing. Additionally, the numerical calculation and simulation are utilized to compute the modification with etching. A fast approach to calculate the modified volume and shape by considering the fluence and material absorption is proposed. The obtained structure formed by anisotropic etching between modified and intrinsic material can be simulated for different etching selectivity. The simulated results agree well with the experimental ones.