کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10674691 | 1010428 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Three dimensional measurement of nanostructures by single event TOF-RBS with nuclear nano probe
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Single, double and triple-layer test structures were measured by time of flight (TOF) Rutherford backscattering spectrometry (RBS) for checking the sensitivity and resolution. A single-layer nanostructure with Au stripes on a Si substrate was resolved by TOF-RBS measurement within a short time of 256Â s. The spatial resolution, measured by the edge of the Au stripes, was 42Â nm. Another single-layer nanostructure with Pt stripes fabricated by electron beam (EB) induced deposition on a Si substrate was resolved by TOF-RBS measurement even at a thickness of Pt stripes less than one mono-layer. Ga embedded layers implanted by a focused ion beam under the Pt stripes fabricated by EB induced deposition on a Si substrate could be detected for a double-layer nanostructure. Furthermore, a triple-layer nanostructure with two Pt stripe layers isolated by a SiO2 layer fabricated by EB induced deposition on a Si substrate could be resolved and cross-sections shown.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 269, Issue 20, 15 October 2011, Pages 2233-2236
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 269, Issue 20, 15 October 2011, Pages 2233-2236
نویسندگان
Satoshi Abo, Shunya Kumano, Takayuki Azuma, Ryota Sugimoto, Kohei Koresawa, Katsuhisa Murakami, Fujio Wakaya, Mikio Takai,