First direct-write lithography results on the Guelph high resolution proton microprobe

Preliminary lithography results have been obtained using spin-coated PMMA photoresist as specimen. The beam spot size, beam range and straggling inside the substrate and the exposure conditions are investigated by using scanning electron microscopy. This facility is the first in Canada to perform focused direct-write ion beam lithography, which is ideal for modification and machining of polymer and semiconductor materials for biological, microfluidic and ultimate lab-on-chip applications.