کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
11026537 | 1666374 | 2018 | 13 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Irradiation of sputtered Al-Si-N coatings by pulsed 200â¯keVâ¯C+ ion beam
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
This paper reports on the effect of the irradiation of Al-Si-N coatings by an intense pulsed ion beam. The Al-Si-N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al-Si-N coating with a high silicon content (30â¯at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al-Si-N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Eiâ¯=â¯200â¯keV, ion current density isâ¯=â¯7 A/cm2, pulse duration tpâ¯=â¯110 ns and radiation dose 2â¯MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al-Si-N coatings.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 158, December 2018, Pages 65-67
Journal: Vacuum - Volume 158, December 2018, Pages 65-67
نویسندگان
G. Remnev, V. Tarbokov, S. Pavlov, F. Konusov, S. Zenkin, J. Musil,