High-performance barrier using a dual-layer inorganic/organic hybrid thin-film encapsulation for organic light-emitting diodes

• We used a relatively simple passivation method by combing epoxy with ZrO2 thin film.
• ZrO2 films deposited by ALD appeared amorphous and smooth with low crystallinity at 80 °C.
• OLEDs capped with the barriers were undamaged in air and the luminance decay time was improved.

We report an inorganic/organic hybrid barrier that combines the alternating deposition of a layer of ZrO2 using low temperature atomic layer deposition and a 16-μm-thick layer of UV-curable NOA63 epoxy using spin-coating. The effective water vapor transmission rates of single ZrO2 film was improved by adding solution epoxy from 3.03 × 10−3 g/m2 day to 1.27 × 10−4 g/m2 day in the hybrid NOA63/ZrO2/NOA63/ZrO2 films at 20 °C and a relative humidity of 60%. In consequence, the organic light-emitting diodes encapsulated with inorganic/organic hybrid barriers were undamaged by environmental oxygen and moisture and their luminance decay time improved by a considerable extent.

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