کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1313657 1499330 2015 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Preparation and surface properties of core–shell fluorosilicone polyacrylate latex film
ترجمه فارسی عنوان
آماده سازی و خواص سطحی فیلم هسته ای فلوروسیلیکون پلی اکریلات لاتکس
کلمات کلیدی
فلوئورسیلیکون پلی اکریلات، پلیمریزاسیون امولسیون، ساختار هسته پوسته، پیوند سیلیکون، رطوبت سطح
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی معدنی
چکیده انگلیسی


• Core–shell fluorosilicone acrylic latex is prepared and characterized.
• Surface morphology of the film annealed for different time is studied.
• Migration behavior of fluorine is investigated in different conditions.
• Annealing is beneficial for surface enrichment of fluorine.

Core–shell fluorosilicone acrylic (FSiA) particles were prepared by two stage emulsion polymerization in the presence of common hydrocarbon acrylic monomers, trifluoroethyl methacrylate (TFEMA) and vinyltriethoxysilane (VTES). Morphology of latex particles was characterized by TEM. Surface properties of the film annealed at 100 °C for 1 h, 3 h, 5 h and 8 h were characterized by ATR–FTIR, AFM and SEM–EDS. Thermal properties of FSiA copolymer were investigated by TG–DSC analysis. TEM analysis indicated that two types of core–shell latex particles (CS-1 and CS-2) occurred in the process of emulsion polymerization, one is that fluorine-containing polymer existed at shell (CS-1), the other is that fluorine-containing polymer existed in the core (CS-2). ATR–FTIR and SEM–EDS data showed that as annealing time was increased, more fluorinated segments were found at the film surface. Fluorine content at the film surface increased from 2.25 wt.% (1.7 atom%) to 4.31 wt.% (3.22 atom%). AFM analysis suggested that the film surface topography was affected significantly by annealing time. The film showed excellent water resistant property due to the crosslinked network of SiOSi in the film.

Fluorine content at film surface increased significantly as annealing time increased from 1 h to 8 h. While silicon-containing segments at the film surface remained almost unchanged in the process of annealing.Figure optionsDownload as PowerPoint slide

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Fluorine Chemistry - Volume 170, February 2015, Pages 17–23
نویسندگان
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