Fabrication of copper–zinc oxide composite thin films from single source precursor by aerosol assisted chemical vapour deposition

A new heterobimetallic complex, Zn2(OAc)6(μ-O)2Cu4(bdmap)2Cl2 (1) where bdmap = 1,3-bis(dimethylamino)-2-propanolato and OAc = acetato, was synthesized by direct interaction of a 2:1.5 mixture of Cu(OCH3)Cl/Zn(OAc)2 · 2H2O with bdmapH in toluene at room temperature and characterized by melting point, elemental analysis, FT-IR spectroscopy, mass spectrometry, thermogravimetric analysis (TGA) and single crystal X-ray diffraction. The aerosol assisted chemical vapour deposition (AACVD) from complex (1) showed that it is a promising precursor to deposit thin films of crystalline Cu–ZnO (2:1) composite. The chemical composition and surface morphology of the deposited thin films were analysed by powder X-ray diffraction (PXRD), scanning electron microscopy (SEM) and energy dispersive analytical X-ray (EDAX), which suggest that the films were thin, crystalline, uniform, smooth and tightly adherent to the substrates with particle size ranging from 0.2–0.5 μm at 250 °C to 0.4–0.9 μm at 475 °C. It was also shown that size of the crystallite can be controlled by controlling deposition temperature of the films. The thickness and voltage–current characteristics of thin films were measured with profilometer and voltmeter by using the four-probe method.

Heterobimetallic complex, [Zn2(OAc)6(μ-O)2Cu4(bdmap)2Cl2] (1), synthesized by direct reaction of Cu(OCH3)Cl, Zn(OAc)2 · 2H2O and bdmapH in toluene was characterized by melting point, CHNS, FT-IR, TGA, mass spectrometry and single crystal X-ray diffraction. The complex (1) was tested to deposit Cu–ZnO composite thin films which were characterized by PXRD, SEM, EDAX, thickness and V–I measurements.Figure optionsDownload as PowerPoint slide