کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1337136 | 979618 | 2009 | 9 صفحه PDF | دانلود رایگان |

The reaction between Ti(OR)4 (R = nBu, iBu, SiMe3) and 2,2-dimethylpropionic acid lead to the formation of hexanuclear μ-oxo titanium(IV) alkoxo carboxylato complexes of the general formula [Ti6O6(OR)6(OOCtBu)6]. Thermal decomposition pathways of these compounds and their potential application in the preparation of TiO2 nanolayers using chemical vapor deposition (CVD) methods have been discussed. The type of the alkoxide ligands causes differences in the thermolysis pathway, and the type of the volatile decomposition products. Among the examined complexes only [Ti6O6(OR)6(OOCtBu)6] (R = iBu, SiMe3) show promising properties for their application as precursors in CVD methods. The TiO2 films were grown in a wide range of substrate temperatures (653–873 °K), under the total reactor pressure 2.0–3.0 mbar. The crystallinity and the composition of layers were analyzed by X-ray diffraction (XRD). It was found that the formation of TiO2 amorphous, anatase or rutile films depends on the deposition temperature and gas phase composition.
The reaction between Ti(OR)4 (R = nBu, iBu, SiMe3) and 2,2-dimethylpropionic acid lead to the formation of hexanuclear μ-oxo titanium(IV) alkoxo carboxylato complexes of the general formula [Ti6O6(OR)6(OOCtBu)6]. Thermal decomposition pathways of these compounds and their potential application in the preparation of TiO2 nanolayers using chemical vapor deposition (CVD) methods have been discussed.Figure optionsDownload as PowerPoint slide
Journal: Polyhedron - Volume 28, Issue 17, 16 November 2009, Pages 3872–3880