کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1443481 | 1509456 | 2009 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabricating semi-conducting polymer photonic structures via near-field scanning optical lithography
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
بیومتریال
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چکیده انگلیسی
Near-field scanning optical lithography (NSOL) is a relatively new technique for patterning delicate organic thin films. Here, it has been used to fabricate a thin film optical phase grating in the semi-conducting polymer poly(p-phenylene vinylene). Recent advances in the development of the NSOL technique have been exploited to demonstrate its capability for producing photonic structures with nanoscale features despite the presence of a relatively large (200Â nm diameter) NSOM tip. In particular, an intricate polymer photonic structure was designed (with fine scale features of the order of 250Â nm) and then fabricated using the NSOL technique. The optical properties of the ideal phase grating were modelled and compared to the diffraction pattern produced by the fabricated structure. Comparison of the ideal and measured patterns showed the technique to be quite capable of consistently creating intricate polymer structures. The methodology employed represents a further step toward the construction of novel photonic devices.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Synthetic Metals - Volume 159, Issues 5â6, March 2009, Pages 456-461
Journal: Synthetic Metals - Volume 159, Issues 5â6, March 2009, Pages 456-461
نویسندگان
Daniel V. Cotton, Christopher J. Fell, Paul C. Dastoor,