کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1443902 1509482 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Photoconductivity in fullerene-doped polysilane thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد بیومتریال
پیش نمایش صفحه اول مقاله
Photoconductivity in fullerene-doped polysilane thin films
چکیده انگلیسی
Flash photolysis time-resolved microwave conductivity (FP-TRMC) measurements have been performed to study the transport properties of charge carriers in the polysilane films. The effect of C60 concentrations on photoconductivity of poly(methylphenylsilane) (PMPS) and poly(n-hexylphenylsilane) (PHPS) films has been studied using a variety of excitation light sources. The value of ϕ∑μ, which is the product of quantum efficiency of photocarrier generation (ϕ) and sum of moibilities of the carriers (∑μ), depends strongly on C60 concentration upon exposure of 532 nm. The quantum efficiency reaches ∼0.06 with C60 concentration at 5.7 mol%, and saturates at the higher concentrations. The ϕ∑μ value increases considerably upon exposure of 193 nm up to 1.22 × 10−3 cm2/Vs without significant dependence on C60 concentration, suggesting the direct formation of electron-hole pair by 6.39 eV photon absorption with the higher ϕ value at ∼0.12. The present technique gave the estimates of intra-chain mobility of charge carriers in PMPS and PHPS, and one-order magnitude higher intra-chain mobility was observed in PHPS than that in PMPS. This is suggestive of a highly ordered Si backbone conformation in PHPS. The intra-chain mobility in PMPS, however, is at least two orders of magnitude higher than the mobility values estimated by conventional time-of-flight techniques. Thus we conclude that the higher mobility than ∼10−3 cm2/Vs (E ∼ 0) is realizable even with PMPS by precise synthesis and device fabrication free from disordering, defects, impurities, etc.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Synthetic Metals - Volume 156, Issues 2–4, 1 February 2006, Pages 293-297
نویسندگان
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